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Surface Science

Volumn 584, Issue 2-3, 2005, Pages 161-168

Ab initio surface reaction energetics of H2X (X = O or S) on Si(0 0 1)-(2 × 1)

(2) Smardon, R D a Srivastava, G P a

a UNIVERSITY OF EXETER (United Kingdom)

Author keywords

Lewis base; Molecular adsorption; Proton tunnelling; Reaction path; Reaction rates; Si(0 0 1) (2 1)

Indexed keywords

ADSORPTION; APPROXIMATION THEORY; BRILLOUIN SCATTERING; DIMERS; DISSOCIATION; FUNCTION EVALUATION; KINETIC ENERGY; MONOLAYERS; PASSIVATION; PROBABILITY DISTRIBUTIONS; REACTION KINETICS; SILICON COMPOUNDS;

LEWIS BASE; MOLECULAR ADSORPTION; PROTON TUNNELING; REACTION PATH; REACTION RATES; SI(001)-(2X1);

SURFACE REACTIONS;

EID: 19744378670 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/j.susc.2005.03.052 Document Type: Article

Times cited : (10)

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