High-volume manufacturing requirements drive EUV source development

Solid State Technology

Volumn 48, Issue 5, 2005, Pages 67-73

  Myers, David W ^a   Fomenkov, Igor V ^a   Partlo, William ^a   Brandt, David C ^a   Klene, Brian C ^a  

^a CYMER INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DISCHARGE-PRODUCED PLASMA (DPP); EXTREME ULTRAVIOLET (EUV); MICROPLASMA; XENON FLUORIDE (XEF);

IONIZATION; LASER PRODUCED PLASMAS; LITHOGRAPHY; MEASUREMENT THEORY; RELIABILITY; VACUUM;

ULTRAVIOLET RADIATION;

EID: 19644376471     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Review

References (0)