Magnetoelastic stress in Cu/Ni/Cu/Si(100) epitaxial thin films

Physical Review B - Condensed Matter and Materials Physics

Volumn 70, Issue 5, 2004, Pages

  Ciria, M ^a,b   Arnaudas, J I ^a   Del Moral, A ^a   O'Handley, R C ^b  

^a CSIC   (Spain)

^b Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALLOY; COPPER; NICKEL; SILICON;

ARTICLE; CRYSTAL STRUCTURE; ELASTICITY; FILM; MAGNETIC FIELD; MAGNETISM; MAGNETOELASTIC STRESS; MECHANICAL STRESS; PHYSICAL PARAMETERS; STRESS STRAIN RELATIONSHIP; TEMPERATURE DEPENDENCE;

EID: 19544394238     PISSN: 01631829     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevB.70.054431     Document Type: Article

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