Electronic stopping powers for fluorine ions in 19 F + -implanted potassium titanyl arsenate

Applied Surface Science

Volumn 228, Issue 1-4, 2004, Pages 77-83

  Liu, Xiangdong ^a   Xia, Yueyuan ^a   Li, Feng ^a   Tan, Zhenyu ^a   Zhao, Mingwen ^a   Xu, Xiangang ^a   Huang, Boda ^a  

^a SHANDONG UNIVERSITY   (China)

Author keywords

Electronic stopping power; KTiOAsO 4; Resonant nuclear reaction

Indexed keywords

COMPUTER SIMULATION; CRYSTALS; ELECTROOPTICAL EFFECTS; FABRICATION; ION IMPLANTATION; IRRADIATION; MONTE CARLO METHODS; OPTICAL PARAMETRIC OSCILLATORS; PHOTOREFRACTIVE MATERIALS; POTASSIUM COMPOUNDS;

ELECTRONIC STOPPING POWER; IONIC CONDUCTIVITY; KTIOASO4; RESONANT NUCLEAR REACTION;

FLUORINE;

EID: 1942517841     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2003.12.034     Document Type: Article

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