Ion Assisted Deposition Processes for Precision and Laser Optics

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5250, Issue , 2004, Pages 519-527

  Ehlers, H ^a   Gross T ^a   Lappschies, M ^a   Ristau, D ^a  

^a LASER ZENTRUM HANNOVER E V   (Germany)

Author keywords

Cold cathode ion source; Ion assisted deposition (IAD); Optical broadband monitoring; Optical coatings; Optical quality; Thermal shift

Indexed keywords

CATHODES; ION BEAM ASSISTED DEPOSITION; ION SOURCES; OPTICAL COATINGS; PHYSICAL VAPOR DEPOSITION; SILICA; TANTALUM COMPOUNDS; THERMODYNAMIC STABILITY; THICKNESS MEASUREMENT; THIN FILMS; TITANIUM DIOXIDE;

COLD CATHODE ION SOURCES; ION ASSISTED DEPOSITION (IAD); OPTICAL BROADBAND MONITORING; OPTICAL QUALITY; THERMAL SHIFTS;

LASER OPTICS;

EID: 1942489708     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.514811     Document Type: Conference Paper

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