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Volumn 39, Issue 6, 1996, Pages
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Advances in plasma equipment modeling
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Author keywords
[No Author keywords available]
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Indexed keywords
COMPUTATIONAL FLUID DYNAMICS;
COMPUTER AIDED DESIGN;
COMPUTER SIMULATION;
KINETIC THEORY;
MATHEMATICAL MODELS;
MONTE CARLO METHODS;
PLASMA DENSITY;
PLASMA ETCHING;
REACTIVE ION ETCHING;
SEMICONDUCTOR DEVICE MANUFACTURE;
THREE DIMENSIONAL;
FLUID MODELS;
KINETIC MODELS;
PLASMA EQUIPMENT MODELS;
PLASMA DEVICES;
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EID: 19244385005
PISSN: 0038111X
EISSN: None
Source Type: Trade Journal
DOI: None Document Type: Article |
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Times cited : (10)
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References (15)
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