Three-dimensional nanolithography with light forces

Microelectronic Engineering

Volumn 57-58, Issue , 2001, Pages 857-863

  Muther T ^a   Schulze, Th ^a   Jurgens D ^a   Oberthaler, M K ^a   Mlynek, J ^a  

^a UNIVERSITY OF KONSTANZ   (Germany)

Author keywords

Atom optical techniques; Three dimensional nanolithography

Indexed keywords

ATOMIC BEAMS; LITHOGRAPHY; OPTICAL DEVICES; OPTICAL FILMS;

LIGHT FORCES;

NANOTECHNOLOGY;

EID: 19244375797     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(01)00442-7     Document Type: Conference Paper

References (11)