Realization of selective low emittance in both thermal atmospheric windows

Optical Engineering

Volumn 44, Issue 2, 2005, Pages 1-7

  Högström, Herman ^a   Forssell, Göran ^b   Ribbing, Carl G ^a,b  

^a UPPSALA UNIVERSITY   (Sweden)

^b SWEDISH DEFENCE RESEARCH AGENCY   (Sweden)

Author keywords

Emissivity; Polaritonic gap; Polarization; Signature control; SiO2 molecular reflectance band

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIELECTRIC MATERIALS; LIGHT EMISSION; LIGHT INTERFERENCE; LIGHT POLARIZATION; LIGHT REFLECTION; MATHEMATICAL MODELS; REFRACTIVE INDEX; SILICA; SILICON WAFERS;

EMISSIVITY; POLARITONIC GAP; SIGNATURE CONTROL; SILICON DIOXIDE MOLECULAR REFLECTANCE BAND;

ATMOSPHERIC OPTICS;

EID: 19044383565     PISSN: 00913286     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.1839887     Document Type: Article

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