Optimum operating conditions leading to complete sterilization at low substrate temperatures in a plasma flowing afterglow

Vide: Science, Technique et Applications

Volumn , Issue 291 SUPPL.2, 1999, Pages 46-50

  Moreau, S ^a   Tabrizian, M ^a   Barbeau, J ^b   Moisan, M ^b   Leduc, A ^b   Pelletier, J ^c   Lagarde, T ^d   Rohr, M ^d   Desor, F ^e   Vidal, D ^e   Ricard, A ^f   Yahia, L'H ^a  

^a ÉCOLE POLYTECHNIQUE DE MONTRÉAL   (Canada)

^b UNIVERSITÉ DE MONTRÉAL   (Canada)

^c UNIV GRENOBLE ALPES   (France)

^d Laboratoire Plasma Metal Process   (France)

^e CENTRE DE RECHERCHES   (France)

^f UNIVERSITÉ PAUL SABATIER   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 18944406139     PISSN: 12660167     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (7)

1. D. Vidal and J. Pelletier, Rapport de fin de Contrat, 1996.
2. B. Gordiets and A. Ricard, Plasma Sources Sci. Technol., 2, 158-163, 1993.
3. M. Moisan and Z. Zakrzewski: J. Phys. D: Appl. Phys., 24, 1025-1048, 1991.
4. th Annual Meeting of the Biomedical Engineering Society, Cleveland (USA), October 1998.
5. S. Moreau, Rapport de Stage FCAR-279, 1998.
6. R.F. Morrissey and G.B. Phillips, Van Nostrand Reinhold, New York, 1993.
7. G. Black and T.G. Slanger, J. Chem. Phys., 74, 6517-6519, 1981.