Thermal-based mass flow control for SDS gas delivery systems

Solid State Technology

Volumn 42, Issue 4, 1999, Pages 59-65

  Urdaneta, Nelson ^a   Krell, John ^a   Brown, Bob ^b,c  

^a Unit Instruments   (United States)

^b Advanced Technology Materials Inc   (United States)

^c IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 18944389984     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (5)

1. J.V. McManus, R. Kirk, "New Developments in SDS Gas Source Technology for Ion Implantation," Proc. of the XI Int. Ion Implant Tech. Conf., IEEE, 1997.
2. R.C. Reid, J.M. Prausnitz, B.E. Poling, The Properties of Gases and Liquids, 4th ed., McGraw-Hill, New York, p. 97, 1987.
3. L'Air Liquide, Gas Encyclopaedia, Elsevier Science Publishers, The Netherlands, pp. 6-11, 1976.
4. Matheson Gas, "Economic Advantages of Using the SDS Gas Source for Ion Implantation," Matheson Electronic Products Group, Technical Bulletin TG-100297-2, March 31, 1998
5. R.L. Brown, "Manufacturing Assessment of Safe Delivery Source (SDS) Gas Source Feed Materials for Ion Implantation," SEMATECH, Technology Transfer #97123423A-TR, December 31, 1997.