SCOPUS 정보 검색 플랫폼

Volumn 338, Issue , 2000, Pages

Real-time assessment of overlayer removal on 4H-SiC surfaces: Techniques and relevance to contact formation

(9) Edwards, N V a Madsen, L D a Robbie, K a Powell, G D b Jarrendahl K a Cobet, C c Esser, N c Richter, W c Aspnes, D E b

a LINKÖPING UNIVERSITY (Sweden)

b NORTH CAROLINA STATE UNIVERSITY (United States)

c TECHNISCHE UNIVERSITÄT BERLIN (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL CLEANING; ELECTRIC CONTACTS; ELLIPSOMETRY; HYDROFLUORIC ACID; METHANOL; SEMICONDUCTING SILICON COMPOUNDS; SILICA; SPECTROSCOPY; SURFACE CLEANING;

OVERLAYER REMOVAL; SPECTROSCOPIC ELLIPSOMETRY;

SILICON CARBIDE;

EID: 18844471891 PISSN: 02555476 EISSN: None Source Type: Conference Proceeding
DOI: None Document Type: Article

Times cited : (2)

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