Tracer measurements of Ni self- diffusion and atomistic calculations of diffusion mechanisms in NiAl

Defect and Diffusion Forum

Volumn , Issue 194-199 PART 1, 2001, Pages 487-492

  Divinski, S V ^a,c   Frank, St ^a   Sodervall U ^b   Herzig, Chr ^a  

^a UNIVERSITY OF MÜNSTER   (Germany)

^b CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

^c INSTITUTE OF METAL PHYSICS   (Ukraine)

Author keywords

Diffusion Mechanism; NiAl; Ordered Intermetallics; Point Defects; Tracer Diffusion

Indexed keywords

ACTIVATION ENERGY; DIFFUSION; ENTHALPY; INTERMETALLICS; SECONDARY ION MASS SPECTROMETRY; SINGLE CRYSTALS; STOICHIOMETRY;

ACTIVATION ENTHALPHY;

NICKEL;

EID: 18844466195     PISSN: 10120386     EISSN: 16629507     Source Type: Journal    
DOI: 10.4028/www.scientific.net/ddf.194-199.487     Document Type: Article

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