Spectral sensitivity of the evaporated photoresist As2S3

Journal of Information Recording

Volumn 23, Issue 4, 1996, Pages 337-346

  Sachatchieva, M A ^a   Mednikarov, B D ^a  

^a CENTRAL LABORATORY OF PHOTOPROCESSES   (Bulgaria)

Author keywords

Contrast; Evaporated photoresist; Photolithography; Photoresist; Sensitivity

Indexed keywords

EID: 18844461343     PISSN: 10256008     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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