In-situ characterisation of organosilane film formation on aluminium alloys by electrochemical quartz crystal microbalance and in-situ ellipsometry

Thin Solid Films

Volumn 483, Issue 1-2, 2005, Pages 66-73

  Le Pen, C ^a   Vuillemin, B ^b   Van Gils, S ^a   Terryn, H ^a   Oltra, R ^b  

^a VRIJE UNIVERSITEIT BRUSSEL   (Belgium)

^b UNIVERSITÉ DE BOURGOGNE   (France)

Author keywords

EQCM; In situ ellipsometry; Quartz microbalance; Silane film formation; XPS

Indexed keywords

CRYSTALLINE MATERIALS; DRYING; ELECTROCHEMISTRY; ELLIPSOMETRY; PARTICULATE EMISSIONS; QUARTZ; REACTION KINETICS; SILANES;

IN-SITU ELLIPSOMETRY; ORGANOSILANE FILM FORMATION; QUARTZ MICROBALANCE (EQCM); REPRODUCIBILITY;

THIN FILMS;

EID: 18844455741     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.12.035     Document Type: Article

References (29)

1. W.J. Van Ooij, and D. Zhu Corrosion 57 2001 413
2. A.M. Beccaria, and C. Bertolotto Electrochim. Acta 42 1997 1361
3. M.A. Petrunin, A.P. Nazarov, and Y.N. Mikhailovski J. Electrochem. Soc. 143 1996 251
4. D. Zhu, and W.J. Van Ooij Prog. Org. Coat. 49 2004 42
5. T. Van Schaftinghen, C. Le Pen, H. Terryn, and F. Horzenberger Electrochim. Acta 49 2004 2997
6. C. Zhang, PhD Thesis, University of Cincinnati, USA, 1997.
7. A. Franquet, PhD Thesis, Vrije Universiteit Brussel, Belgium, 2002.
8. A. Franquet, C. Le Pen, H. Terryn, and J. Vereecken Electrochim. Acta 48 2003 1245
9. V. Subramanian, and W.J. Van Ooij Corrosion 54 1998 204
10. A. Franquet, J. De Laet, T. Schram, H. Terryn, V. Subramanian, W.J. Van Ooij, and J. Vereecken Thin Solid Films 384 2001 37
11. A. Franquet, H. Terryn, and J. Vereecken Thin Solid Films 441 2003 76
12. D. Zhu, and W.J. Van Ooij Electrochim. Acta 49 2004 1113
13. E.D. Plueddemann Silane coupling agents 1990 Plenum Press New York, N.Y.
14. M.L. Abel, R.P. Digby, I.W. Fletcher, and J.F. Watts Surf. Interface Anal. 29 2000 115
15. Z. Pu, W.J. Van Ooij, and J.E. Mark J. Adhes. Sci. Technol. 11 1997 137
16. B. Vuillemin, R. Oltra, H. Perrot, C. Sauvage, and O. Néel J. Electrochem. Soc. 151 2004 C229
17. K. Hemmes, M.A. Hamstra, K.R. Koops, M.M. Wind, T. Schram, J. De Laet, and H. Bender Thin Solid Films 313-314 1998 40
18. A.C. Hillier, and M.D. Ward Anal. Chem. 64 1992 2539
19. D.A. Buttry A.J. Bard Electroanalytical chemistry vol. 17 1990 Dekker New York, N.Y.
20. J.J. Garcia-Jareno, C. Gabrielli, and H. Perrot Electrochem. Commun. 2 2000 195
21. K.K. Kanazawa, and J.G. Gordon Anal. Chem. 57 1985 1771
22. K.K. Kanazawa, and J.G. Gordon Anal. Chim. Acta 175 1985 99
23. D.Y. Smith, E. Shiles, and M. Inokuti E.D. Palik Handbook of optical constants of solids vol. 1 1998 Academic Press
24. F. Gervais E.D. Palik Handbook of optical constants of solids vol. 2 1998 Academic Press
25. A. Franquet, H. Terryn, P. Bertrand, and J. Vereecken Surf. Interface Anal. 34 2002 25
26. M.R. Alexander, G. Beamson, P. Bailey, T.C.Q. Noakes, P. Skeldon, and G.E. Thompson Surf. Interface Anal. 35 2003 649
27. F. Sinapi, J. Delhalle, and Z. Mekhalif Mater. Sci. Eng., C, Biomim. Mater., Sens. Syst. 22 2002 345
28. P.R. Underhill, G. Goring, and D.L. Duquesnay Int. J. Adhes. Adhes. 18 1998 307
29. M. Teo, J. Kim, P.C. Wong, K.C. Wong, and K.A.R. Mitchell Appl. Surf. Anal. 221 2004 340