Effects of seeding methods on the fabrication of microcrystalline silicon solar cells using radio frequency plasma enhanced chemical vapor deposition

Thin Solid Films

Volumn 483, Issue 1-2, 2005, Pages 84-88

  Li, Yuan Min ^a   Li, Liwei ^b   Selvan, J A Anna ^a   Delahoy, Alan E ^a   Levy, Roland A ^b  

^a Energy Photovoltaics Inc   (United States)

^b NEW JERSEY INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Chemical vapor deposition; Nucleation; Silicon; Solar cells

Indexed keywords

COSTS; FREQUENCIES; GROWTH (MATERIALS); HYDROGEN; NUCLEATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTOR JUNCTIONS; SILICON;

CURRENT-VOLTAGE CURVE (IV); HYDROGEN DILUTION; SEEDING METHODS; SINGLE CHAMBER RADIO FREQUENCY;

SOLAR CELLS;

EID: 18844435138     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.12.029     Document Type: Article

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