An investigation of sustained machining performance for controlled surface quality requirements in porous tungsten

IEEE Transactions on Electron Devices

Volumn 52, Issue 5, 2005, Pages 903-908

  Chen, Shi ^a   Head, Dustin ^a   Effgen, Michael ^b   Jawahir, I S ^a  

^a UNIVERSITY OF KENTUCKY   (United States)

^b Semicon Associates Inc   (United States)

Author keywords

Cathode; Polycrystalline diamond (PCD); Porous tungsten; Tool wear

Indexed keywords

CATHODES; CORRELATION METHODS; DIAMOND CUTTING TOOLS; MACHINING; MATHEMATICAL MODELS; POLYCRYSTALLINE MATERIALS; POROSITY; POROUS MATERIALS; SCANNING ELECTRON MICROSCOPY;

POLYCRYSTALLINE DIAMOND; POROUS TUNGSTEN; TOOL WEAR;

TUNGSTEN;

EID: 18844386267     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2005.846352     Document Type: Article

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