Proximity correction for electron beam lithography

Optical Engineering

Volumn 35, Issue 9, 1996, Pages 2685-2692

  Marrian, Christie R K ^a  

^a NAVAL RESEARCH LABORATORY   (United States)

Author keywords

Dose modulation; E beams; Electron scattering; Lithography; Proximity effects; Regularized optimization

Indexed keywords

EID: 18844371782     PISSN: 00913286     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.600846     Document Type: Article

References (31)

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