Soft X-ray spectromicroscopy and its application to semiconductor microstructure characterization

Acta Physica Polonica A

Volumn 91, Issue 4, 1997, Pages 697-705

  Gozzo, F ^a   Franck, K ^a   Howells, M R ^a   Hussain, Z ^a   Warwick, A ^a   Padmore, H A ^a   Triplett, B B ^b  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 18844366686     PISSN: 05874246     EISSN: None     Source Type: Journal    
DOI: 10.12693/APhysPolA.91.697     Document Type: Article

References (6)

1. S.P. Murarka, Metallization: Theory and Practice for VLSI and ULSI, Butterworth-Heinemann, Boston 1993.
2. K. Kikuta, MRS Bull. XX, 53 (1995).
3. Y. Shacham-Diamand, MRS Bull. XX, 78 (1995).
4. P. Singer, Semicond. Int., 88 (1996).
5. G. Margaritondo, F. Cerrina, Nucl. Instrum. Methods Phys. Res. A 291, 26 (1990).
6. U. Gelius, B. Wannberg, P. Baltzer, II. Fellner-Feldegg, G. Carlson, C.G. Johansson, J. Larsson, P. Münger, G. Vegerfors, J. Electron Spectrosc. Relat. Phenom. 52, 747 (1990).