Stability and interdiffusion at the a-C/Si(100) interface

Journal of Non-Crystalline Solids

Volumn 227-230, Issue PART 2, 1998, Pages 1113-1117

  Logothetidis, S ^a   Gioti, M ^a   Kelires, P C ^b,c  

^a ARISTOTLE UNIVERSITY OF THESSALONIKI   (Greece)

^b UNIVERSITY OF CRETE   (Greece)

^c INSTITUTE OF COMPUTER SCIENCE   (Greece)

Author keywords

Ellipsometry; Interdiffusion; Monte carlo simulations

Indexed keywords

AMORPHOUS FILMS; CARBON; COMPUTER SIMULATION; ELLIPSOMETRY; FILM GROWTH; INTERDIFFUSION (SOLIDS); INTERFACES (MATERIALS); MONTE CARLO METHODS; SPUTTER DEPOSITION; SUBSTRATES;

AMORPHOUS CARBON LAYERS;

AMORPHOUS SILICON;

EID: 18744429912     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(98)00291-9     Document Type: Article

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