Plume expansion of a laser-induced plasma studied with the particle-in-cell method

Applied Surface Science

Volumn 197-198, Issue , 2002, Pages 229-238

  Ellegaard, O ^a   Nedelea, T ^b   Schou, J ^a   Urbassek, H M ^b  

^a TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

^b University of Koblenz Landau   (Germany)

Author keywords

Laser ablation; Particle in cell method; Plasma expansion; Plasma simulation

Indexed keywords

CARRIER CONCENTRATION; COMPUTER SIMULATION; ENERGY TRANSFER; KINETIC ENERGY; LASER PRODUCED PLASMAS;

PLASMA EXPANSIONS;

SURFACE CHEMISTRY;

EID: 18744429166     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(02)00370-7     Document Type: Conference Paper

References (33)

1. M. von Allmen, A. Blatter, Laser beam Interaction with Materials, 2nd Edition, Springer, New York, 1995.
2. D.B. Chrisey, C.K. Hubler (Eds.), Pulsed Laser Deposition of Thin Films, Wiley, New York, 1994.
3. Willmott P.R., Huber J.R. Rev. Mod. Phys. 72 2000 315.
4. Guidoni A.G., Kelly R., Miele A., Miotello A. Plasma Sources Sci. Technol. 6 1997 260.
5. Vertes A., Dreyfus R.W., Platt D.E. IBM J. Res. Dev. 38 1994 3.
6. R.W. Dreyfus, C. Phipps, A. Vertes, AIP Conf. Proc. 288 (1993) 285.
7. Sibold D., Urbassek H.M. Phys. Rev. A. 43 1991 6722.
8. Schreiner P., Urbassek H.M. J. Phys. D 30 1997 185S.
9. Itina T.E., Marine W., Autric M. J. Appl. Phys. 85 1999 7905.
10. Garrelie F., Champeaux C., Catherinot A. Appl. Phys. A. 69 1999 S45.
11. Ellegaard O., Schou J., Urbassek H.M. Appl. Phys. A 69 1999 S577.
12. Hansen T.N., Schou J., Lunney J.G. Europhys. Lett. 40 1997 441.
13. B. Thestrup, B. Toftmann, J. Schou, B. Doggett, J.G. Lunney, these proceedings.
14. von der Linde D., Sokolowski-Tinten K. Appl. Surf. Sci. 154-155 2000 1.
15. Ye M., Grigoropoulos C.P. J. Appl. Phys. 89 2001 5183.
16. Granse G., Völlmar S., Lenk A., Rupp A., Rohr K. Appl. Surf. Sci. 96-98 1996 97.
17. Hansen T.N., Schou J., Lunney J.G. Appl. Phys. Lett. 72 1998 1829.
18. Hansen T.N., Toftmann B., Schou J., Lunney J.G. Appl. Phys. A 69 1999 S601.
19. Toftmann B., Schou J., Hansen T.N., Lunney J.G. Phys. Rev. Lett. 84 2000 3998.
20. Amoruso S., Wang X., Altucci C., de Lisio C., Armenante M., Bruzesse R., Velotta R. Appl. Phys. Lett. 77 2000 3728.
21. Dyer P.E. Appl. Phys. Lett. 55 1989 1630.
22. Amoruso S., Armenante M., Bruzzese R., Spinelli N., Velotta R., Wang X. Appl. Phys. Lett. 75 1999 7.
23. B. Toftmann, J. Schou, T.N. Hansen, J.G. Lunney, Appl. Surf. Sci., in press.
24. Anisimov S.I., Luk'yanchuk B.S., Luches A. Appl. Surf. Sci. 96-98 1996 24.
25. Denavit J. Phys. Fluids 22 1979 1384.
26. Crow J.E., Auer P.L., Allen J.E. J. Plasma Phys. 14 1975 65.
27. Sack C., Schamel H. Phys. Rep. 156 1987 311.
28. C.K. Birdsall, A.B. Langdon, Plasma Physics via Computer Simulation, IoP Publishing, Bristol, 1991.
29. Birdsall C.K. IEEE. Trans. Plasma Sci. 19 1991 65.
30. T. Nedelea, H.M. Urbassek, Phys. Plasmas (in press).
31. Ermer D.R., Langford S.C., Dickinson J.T. Appl. Surf. Sci. 127-129 1998 977.
32. R.W. Hockney, J. Eastwood, Computer Simulation Using Particles, Adam Hilger, Bristol, 1989.
33. Stoian R., Ashkenasi D., Rosenfeld A., Campbell E.E.B. Phys. Rev. B 62 2000 13167.