Optical near-field and thermal nanolithography using organic dry developing photoresist

Nanotechnology

Volumn 16, Issue 6, 2005, Pages 775-778

  Noach, Salman ^a   Manevich, Michael ^a   Eisenberg, Naftali P ^a   Fokin, Evgeny P ^b   Mihalina, Tatiana V ^b  

^a JERUSALEM COLLEGE OF TECHNOLOGY   (Israel)

^b N N VOROZHTSOV NOVOSIBIRSK INSTITUTE OF ORGANIC CHEMISTRY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; EVAPORATION; HEAT TREATMENT; PHOTORESISTS; PHOTOSENSITIVITY; SEMICONDUCTING ORGANIC COMPOUNDS; THERMAL EFFECTS; THERMODYNAMIC STABILITY; VACUUM APPLICATIONS;

DRY THERMAL PROCESSES; NAPHTHOQUINONE; OPTICAL NEAR-FIELD SOURCES; ORGANIC PHOTORESIST FILMS;

NANOTECHNOLOGY;

EID: 18744416934     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/16/6/026     Document Type: Article

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