Switching characteristics of Pb(Zr0.52Ti0.48)O3 thin films prepared by RF magnetron sputtering

Journal of the Korean Physical Society

Volumn 29, Issue SUPPL. 3, 1996, Pages

  Chae, Byung Gyu ^a   Lee, Su Jae ^a   Cho, Chae Ryong ^b   Kim, Seong Hyun ^a   Yang, Yong Suk ^a   Joo, Heung Jin ^a   Jang, Min Su ^a  

^a Pusan National University   (South Korea)

^b UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 18744414573     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (10)

1. J. F. Scott and C. A. Araujo, Science 246, 1400 (1989).
2. Y. Ishibashi, Y. Takagi, J. Phys. Soc. Jpn. 31, 506 (1971).
3. H. M. Duiker and P. D. Beale, Phys. Rev. B, 41, 490 (1990).
4. T. Katayama, M. Shimizu and T. Shiosaki, Jpn. J. Appl. Phys. 32, 3943 (1993).
5. E. Tokumitsu, N. Tanisake and H. Ishiwara, Jpn. J. Appl. 33, 5201 (1994).
6. S. Yamauchi, H. Tamura, M. Yoshimanu and M. Ino, Jpn. J. Appl. Phys. 32, 4118 (1993).
7. F. Varniere, E. Cattan, B. Eakim, H. Achard and B. Agius, Mat. Res. Soc. Symp. Proc. 310, 23 (1993).
8. W. Zhang, K. Sasaki and T. Hata, Jpn. J. Appl. Phys. 34, 5120 (1995).
9. E. Fatuzzo and W. J. Merz, Phys. Rev. 116, 61 (1959).
10. J. F. Scott, L. Kammerdiner, M. Parris, S. Traynon, V. Ottenbacher, A. Shawabkeh and W. F. Oliver, J. Appl. Phys. 64, 787 (1988).