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Volumn 80, Issue 4, 2000, Pages 459-473
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Plasma-enhanced chemical vapour deposition of microcrystalline silicon: On the dynamics of the amorphous-microcrystalline interface by optical methods
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 18744402453
PISSN: 13642812
EISSN: None
Source Type: Journal
DOI: 10.1080/014186300255113 Document Type: Conference Paper |
Times cited : (12)
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References (28)
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