Enhancement of surface damage resistance by selective chemical removal of CeO2

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5647, Issue , 2005, Pages 187-

  Kamimura, Tomosumi ^a   Motokoshi, Shinji ^b   Sakamoto, Takayasu ^b   Jitsuno, Takahisa ^b   Shiba, Haruya ^c   Akamatsu, Shigenori ^c   Horibe, Hideo ^c   Okamoto, Takayuki ^d   Yoshida, Kunio ^a  

^a OSAKA INSTITUTE OF TECHNOLOGY   (Japan)

^b OSAKA UNIVERSITY   (Japan)

^c KOCHI NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

^d Okamoto Optics Works Co Ltd   (Japan)

Author keywords

Fused silica, laser induced surface damage, cerium dioxide (ceo 2), selective chemical removal, sulfuric acid (h2so 4)

Indexed keywords

CERIUM COMPOUNDS; CLEANING; DISSOLUTION; FUSED SILICA; HIGH TEMPERATURE EFFECTS; REMOVAL; SULFURIC ACID; SURFACE ROUGHNESS; SURFACE TREATMENT;

HIGH-TEMPERATURE SULFURIC ACID; LASER-INDUCED SURFACE DAMAGE; OPTICAL POLISHING; SELECTIVE CHEMICAL REMOVAL;

LASER DAMAGE;

EID: 18744390340     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.585219     Document Type: Conference Paper

References (0)