Reactive sputter deposition of alumina thin films using a hollow cathode sputtering source

Review of Scientific Instruments

Volumn 73, Issue 11, 2002, Pages 3841-

  Pradhan, Anshu A ^a   Ismat Shah, S ^a   Unruh, Karl M ^a  

^a UNIVERSITY OF DELAWARE   (United States)

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EID: 18744380043     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1512340     Document Type: Article

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