Mobile charge, soft breakdown, and self-healing in hydrogen silsesquioxane based intermetal dielectric

Journal of Applied Physics

Volumn 92, Issue 6, 2002, Pages 3162-3168

  Devine, R A B ^a,b  

^a AIR FORCE RESEARCH LABORATORY   (United States)

^b UNIVERSITY OF NEW MEXICO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BREAKDOWN PHENOMENA; CURED FILMS; ELECTRICAL CHARACTERISTIC; FLOWABLE OXIDE; HYDROGEN SILSESQUIOXANE; INTER-METAL DIELECTRICS; MOBILE CHARGE; NEGATIVE BIAS; NEGATIVE CHARGE; POSITIVE CHARGES; SELF HEALING EFFECT; SELF-HEALING; SOFT BREAKDOWN; TIME DEPENDENT;

ELECTRIC FIELDS; POLYPEPTIDES;

OXIDE FILMS;

EID: 18644381324     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1499234     Document Type: Article

References (10)

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