Development of low-loss optical coatings for 157 nm lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691 II, Issue , 2002, Pages 1625-1634

  Biro, Ryuji ^a   Sone, Kazuho ^a   Niisaka, Shunsuke ^b   Otani, Minoru ^a   Suzuki, Yasuyuki ^a   Ouchi, Chidane ^a   Saito, Tadahiko ^b   Hasegawa, Masanobu ^a   Saito, Jun ^b   Tanaka, Akira ^b   Matsumoto, Akira ^b  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^b NIKON CORPORATION   (Japan)

Author keywords

Coating; F2 laser; Lithography

Indexed keywords

ANTIREFLECTION COATINGS; CALCIUM COMPOUNDS; LASER BEAM EFFECTS; LENSES; OPTICAL SYSTEMS;

OPTICAL LOSSES;

PHOTOLITHOGRAPHY;

EID: 18644365329     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474550     Document Type: Article

References (4)

1. M. Otani et al., "Development of Optical Coating for 157 nm Lithography (II: Multilayer Coatings)", presented at OSA/OIC Optical Meeting, July 16-20, 2001, Banff, Canada.
2. 2 lithography", presented at SPIE Annual Meeting, 29 July-3 August 2001, San Diego, California USA.
3. T. Saito et al., "Measurement of total integrated scatter of optical coatings for 157 nm lithography", presented at SPIE Annual Meeting, 29 July-3 August 2001, San Diego, California USA.
4. S. Niisaka et al., "Development of Optical Coating for 157nm Lithography (I: Coating Materials)", presented at OSA/OIC Optical Meeting, July 16-20, 2001, Banff, Canada.