Ion bombardment effect on the properties of hydrogenated amorphous carbon films

Surface and Coatings Technology

Volumn 103-104, Issue , 1998, Pages 380-383

  Chen, Z Y ^a   Yu, Y H ^a   Zhao, J P ^a   Ren, C X ^a   Ding, X Z ^a   Shi, T S ^a   Liu, X H ^a  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

Author keywords

Hydrogenated amorphous carbon films; Ion bombardment; Lon beam assisted deposition

Indexed keywords

BAND STRUCTURE; CARBON; DEPOSITION; ELECTRON ENERGY LEVELS; ELLIPSOMETRY; HYDROGENATION; INFRARED SPECTROSCOPY; ION BEAMS; ION BOMBARDMENT; MOLECULAR STRUCTURE; OPTICAL PROPERTIES; ULTRAVIOLET SPECTROSCOPY;

HYDROGENATED AMORPHOUS CARBON FILMS; ION BEAM ASSISTED DEPOSITION; ULTRAVIOLET VISIBLE TRANSMITTANCE SPECTROSCOPY;

AMORPHOUS FILMS;

EID: 18544406160     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(98)00416-2     Document Type: Article

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