SCOPUS 정보 검색 플랫폼

Volumn 14, Issue 3-7, 2005, Pages 1198-1202

Comparative study of c-axis AlN films sputtered on metallic surfaces

(9) Sanz Hervas A a,c Vergara, L a Olivares, J a Iborra, E a Morilla, Y b Garcia Lopez J b Clement, M a Sangrador, J a Respaldiza, M A b

a UNIVERSIDAD POLITÉCNICA DE MADRID (Spain)

b CENTRO NACIONAL DE ACELERADORES (Spain)

c UNIVERSIDAD POLITÉCNICA DE MADRID (Spain)

Author keywords

Aluminum nitride; Interface characterization; Microstructure; Sputtering

Indexed keywords

ALUMINUM NITRIDE; COMPOSITION; CONCENTRATION (PROCESS); CRYSTAL STRUCTURE; MICROSTRUCTURE; RESIDUAL STRESSES; SILICON WAFERS; SPUTTERING; STOICHIOMETRY; STRAIN RATE; SURFACE PHENOMENA;

CRYSTAL QUALITY; INTERFACE CHARACTERIZATION; METALLIC LAYERS; METALLIC SURFACES;

METALLIC FILMS;

EID: 18544379352 PISSN: 09259635 EISSN: None Source Type: Journal
DOI: 10.1016/j.diamond.2004.11.010 Document Type: Conference Paper

Times cited : (29)

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