Ion beam shadowing effects in SIMS depth profile analysis of MBE-grown nanostructures

Vacuum

Volumn 78, Issue 2-4, 2005, Pages 291-295

  Cwil M ^a,b   Konarski, P ^a  

^a TELE AND RADIO RESEARCH INSTITUTE   (Poland)

^b WARSAW UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

Depth profile analysis; Ion beam sputtering; Nanostructures; SIMS

Indexed keywords

COMPUTER SIMULATION; CURRENT DENSITY; ION BOMBARDMENT; MOLECULAR BEAM EPITAXY; MONTE CARLO METHODS; NANOSTRUCTURED MATERIALS; OSCILLATIONS; SEMICONDUCTING INDIUM COMPOUNDS; SPUTTERING; WAVEGUIDES;

DEPTH PROFILE ANALYSIS; ION BEAM SPUTTERING; LASER STRUCTURES; ULTRA-LOW ENERGY BEAMS;

ION BEAMS;

EID: 18444414301     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2005.01.041     Document Type: Conference Paper

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