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Volumn 278, Issue 1-4, 2005, Pages 188-192

Growth of dilute GaNSb by plasma-assisted MBE

Author keywords

A1. Doping; A1. X ray diffraction; A3. Molecular beam epitaxy; B1. Antimonides; B2. Semiconducting gallium compounds; B2. Semiconducting III V materials

Indexed keywords

CRYSTAL GROWTH; ELECTRONIC EQUIPMENT; MOLECULAR BEAM EPITAXY; NEGATIVE IONS; NITROGEN; SEMICONDUCTOR DOPING; THERMAL EFFECTS; X RAY DIFFRACTION;

EID: 18444405259     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2004.12.148     Document Type: Conference Paper
Times cited : (35)

References (9)
  • 7
    • 18444406195 scopus 로고    scopus 로고
    • Private communication - parameters from tight binding calculations for 5-band k.p model of GaNSb
    • A. Lindsay, E.P. O'Reilly, Private communication - parameters from tight binding calculations for 5-band k.p model of GaNSb.
    • Lindsay, A.1    O'Reilly, E.P.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.