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Journal of Materials Research

Volumn 19, Issue 2, 2004, Pages 409-412

The reaction sequence and microstructure evolution of an MgB2 layer during ex situ annealing of amorphous boron film

(7) Kim, Hyun Mi a Yim, Sung Soo a Kim, Ki Bum a Kang, Dae Hwan a Moon, Seung Hyun a Kim, Young Woon a Lee, Ho Nyun b

a Seoul National University (South Korea)

b LG Electronics Inc (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ANNEALING; CRYSTAL GROWTH; CRYSTALLINE MATERIALS; EVAPORATION; MICROSTRUCTURE; NUCLEATION; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING BORON; SUBSTRATES; SURFACE ROUGHNESS; THIN FILMS;

CRYSTALLOGRAPHIC ORIENTATIONS; MICROSTRUCTURE EVOLUTION;

MAGNESIUM COMPOUNDS;

EID: 1842816426 PISSN: 08842914 EISSN: None Source Type: Journal
DOI: 10.1557/jmr.2004.0046 Document Type: Article

Times cited : (3)

References (7)

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