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Volumn 44, Issue 3 I, 2004, Pages 543-546
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Random Walk Deposition with Relaxation
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Author keywords
Critical exponent; Local slope; Normalized surface width; Random walk deposition; Surface width
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Indexed keywords
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EID: 1842767180
PISSN: 03744884
EISSN: None
Source Type: Journal
DOI: 10.3938/jkps.44.543 Document Type: Conference Paper |
Times cited : (4)
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References (20)
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