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Volumn 44, Issue 3 I, 2004, Pages 543-546

Random Walk Deposition with Relaxation

Author keywords

Critical exponent; Local slope; Normalized surface width; Random walk deposition; Surface width

Indexed keywords


EID: 1842767180     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: 10.3938/jkps.44.543     Document Type: Conference Paper
Times cited : (4)

References (20)
  • 9
    • 44949288909 scopus 로고
    • F. Family, Physica 168A, 561 (1990).
    • (1990) Physica , vol.168 A , pp. 561
    • Family, F.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.