Some physical properties of spray deposited SnO2 thin films

Journal of Optoelectronics and Advanced Materials

Volumn 6, Issue 1, 2004, Pages 197-203

  Elangovan, E ^a   Singh, M P ^b   Dharmaprakash, M S ^c   Ramamurthi, K ^a  

^a BHARATHIDASAN UNIVERSITY   (India)

^b INDIAN INSTITUTE OF SCIENCE   (India)

^c BMS COLLEGE OF ENGINEERING   (India)

Author keywords

SnCl2 precursor; Spray pyroiysis; Tin oxide thin films

Indexed keywords

CARRIER CONCENTRATION; CRYSTAL ORIENTATION; DEPOSITION; ELECTRIC CONDUCTIVITY; GLASS; PYROLYSIS; SCANNING ELECTRON MICROSCOPY; TIN COMPOUNDS;

SNCL2 PRECURSOR; SPRAY PYROLYSIS; TIN OXIDE THIN FILMS;

THIN FILMS;

EID: 1842732514     PISSN: 14544164     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (16)

1. C. Bauer, Ann. Phys. 30, 433 (1937).
2. K. Napo, F. Kadi Allah, J.C. Bernede, N. Barreau, A. Khelil, Thin Solid Films 427, 386 (2003).
3. F. Berger, E. Brunol, R. Planade, A. Chambaudet, Thin Solid Films 436, 1 (2003).
4. S. Mishra, C. Ghanshyam, N. Ram, S. Singh, R. P. Bajpai, R. K. Bedi, Bull. Mater. Sci. 25, 231 (2002).
5. J. W. Hammond, C. C. Liu, Sensors and Actuators B 81, 25 (2001).
6. E. Elangovan, K. Ramamurthi, J. Optoelectron. Adv. Mater. 5, 45 (2003).
7. E. Elangovan, K. Ramamurthi, Cryst. Res. Technol. 38, 779 (2003).
8. E. Elangovan, K. Ramamurthi, J. Optoelectron. Adv. Mater. 5, 415 (2003).
9. G. Haacke, J. Appl. Phys. 47, 4086 (1976).
10. A. E. Rakhshani, J. Appl. Phys. 81, 7988 (1997).
11. M. Kojima, H. Kato, M. Gatto, Phil. Mag. B, 68, 215 (1993).
12. J. E. Whitney, N. Davidson, J. Am. Ceram. Soc. 71, 3809 (1949).
13. K. Nassau, Am. Mineral. 63, 219 (1978).
14. M. T. Mohammed, W. A. Abdul Ghafor, Solid State Commn. 72, 1043 (1989).
15. G. Frank, E. Kauer, H. Kostlin, Thin Solid Films 77, 107 (1981).
16. P. Nath, R. F. Bunshah, Thin Solid Films 69, 63 (1980).