Optical interferometric determination of in-plane residual stresses in SiO2 films on silicon substrates

Materials Evaluation

Volumn 54, Issue 10, 1996, Pages 1167-1170

  Ghaffari, Kasey ^a   Wang, B ^a   Danyluk, Steven ^a   Billone, M ^b   Pharr, G ^c  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

^b ARGONNE NATIONAL LABORATORY   (United States)

^c Rice University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

SILICON OXIDES;

IN-PLANE RESIDUAL STRESS; INTERFEROMETRIC DETERMINATION; OPTICAL-; SILICON SUBSTRATES;

SILICA;

EID: 1842675451     PISSN: 00255327     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (17)

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