Coming clean about "on and off the roadmap": Sub-100ppt bulk gas supply

Solid State Technology

Volumn 47, Issue 3, 2004, Pages 35-42

  Mackie, Andy ^a   Warrick, Brian ^a  

^a PRAXAIR INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GAS PURITY; ULTRACLEAN TECHNOLOGY (UTC);

CARBON DIOXIDE; GAS CHROMATOGRAPHY; GAS FUEL PURIFICATION; IMPURITIES; MASS SPECTROMETRY; METHANE; MOISTURE;

GAS SUPPLY;

EID: 1842631953     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (6)

1. At time of writing, the current (2002) Edition of the ITRS was available at http://public.itrs.net. Tables 95.a. and 95.b are quoted.
2. See, for example, T. Ohmi, "Ultraclean Technology: ULSI Processing's Crucial Factor," Microcontamination, pp. 48-58, October 1988.
3. J.J.F. McAndrew, "Humidity Measurement in Gases for Semiconductor Processing," p. 31 in Specialty Gas Analysis, ed. J.D. Hogan, Wiley-VCH, NY, 1997.
4. B. Warrick, "Detection of Non-Standard Impurities by APIMS in Semiconductor-Grade Nitrogen," Proc. of SEMICON West, 2002.
5. J. O'Sullivan, "Use of Fluoropolymer and All-Stainless Steel Filters in Ultraclean Gas Distribution Systems," Pall report STR-PUF 31 (available at http://www.pall.com).
6. S.N. Ketkar, et al., "The Use of Proton Transfer Reactions to Detect Low Levels of Impurities in Bulk Oxygen...," Intl. Jour. of Mass Spectrometry, Vol. 206, pp. 7-12, 2001.