An investigation of Cr etch kinetics

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5256, Issue 2, 2003, Pages 701-712

  Wu, Banqiu ^a  

^a PHOTRONICS INC   (United States)

Author keywords

Etch kinetics; Photomask; Plasma etch

Indexed keywords

CHROMIUM; ELECTRON BEAMS; ETCHING; FUSED SILICA; INDUCTIVELY COUPLED PLASMA; OXYGEN; PARTIAL PRESSURE; PHOTOLITHOGRAPHY; REACTION KINETICS; SCANNING ELECTRON MICROSCOPY;

ETCH KINETICS; PHOTOMASKS; PLASMA ETCH;

MASKS;

EID: 1842579614     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.517933     Document Type: Conference Paper

References (11)

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