Response of chemical vapor deposition diamond detectors to X-ray

Solid State Communications

Volumn 130, Issue 6, 2004, Pages 425-428

  Minglong, Zhang ^a   Yiben, Xia ^a   Linjun, Wang ^a   Hujiang, Shen ^a  

^a SHANGHAI UNIVERSITY   (China)

Author keywords

A. Chemical vapor deposition diamond; C. X ray; D. Radiation detector

Indexed keywords

CARRIER MOBILITY; CHEMICAL VAPOR DEPOSITION; CURRENT VOLTAGE CHARACTERISTICS; DIAMONDS; ELECTROCHEMICAL ELECTRODES; ENERGY GAP; EVAPORATION; SIGNAL TO NOISE RATIO; SYNTHESIS (CHEMICAL); X RAYS;

DIAMOND DETECTORS; HOT FILAMENT CHEMICAL VAPOR DEPOSITION (HFCVD);

RADIATION DETECTORS;

EID: 1842575623     PISSN: 00381098     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ssc.2004.01.013     Document Type: Article

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