메뉴 건너뛰기




Volumn 565, Issue 2, 2004, Pages 203-209

Voltammetric and structural characterization of sputter deposited Al-Mg films

Author keywords

Aluminium magnesium alloys; Atomic force microscopy (AFM); Corrosion; Magnetron sputtering; Surface structure

Indexed keywords

ATOMIC FORCE MICROSCOPY; CORROSION RESISTANCE; CRYSTALLINE MATERIALS; ELECTROCHEMISTRY; MAGNETRON SPUTTERING; METALLIC FILMS; MOLECULAR STRUCTURE; PASSIVATION; SPUTTER DEPOSITION;

EID: 1842560478     PISSN: 15726657     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jelechem.2003.10.009     Document Type: Article
Times cited : (26)

References (38)
  • 38
    • 85009391257 scopus 로고    scopus 로고
    • A. Griguceviciene, K. Leinartas, R. Juskenas, E. Juzeliunas, Chemija, submitted for publication
    • A. Griguceviciene, K. Leinartas, R. Juskenas, E. Juzeliunas, Chemija, submitted for publication.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.