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Volumn 39, Issue 5, 2004, Pages 1895-1898
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Production of thin film silicon-doped hydroxyapatite via sputter deposition
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Author keywords
[No Author keywords available]
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Indexed keywords
ANNEALING;
CRYSTAL LATTICES;
CRYSTALLINE MATERIALS;
DOPING (ADDITIVES);
ENERGY DISPERSIVE SPECTROSCOPY;
GLASS;
MAGNETRON SPUTTERING;
PLASMA SPRAYING;
PRECIPITATION (CHEMICAL);
SCANNING ELECTRON MICROSCOPY;
SILICON;
SPUTTER DEPOSITION;
THIN FILMS;
TITANIUM COMPOUNDS;
TRANSMISSION ELECTRON MICROSCOPY;
X RAY DIFFRACTION ANALYSIS;
PHASE PURITY;
SELECTED AREA ELECTRON DIFFRACTION (SAED);
HYDROXYAPATITE;
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EID: 1842535201
PISSN: 00222461
EISSN: None
Source Type: Journal
DOI: 10.1023/B:JMSC.0000016213.77001.71 Document Type: Article |
Times cited : (39)
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References (6)
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