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Volumn 39, Issue 5, 2004, Pages 1895-1898

Production of thin film silicon-doped hydroxyapatite via sputter deposition

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTAL LATTICES; CRYSTALLINE MATERIALS; DOPING (ADDITIVES); ENERGY DISPERSIVE SPECTROSCOPY; GLASS; MAGNETRON SPUTTERING; PLASMA SPRAYING; PRECIPITATION (CHEMICAL); SCANNING ELECTRON MICROSCOPY; SILICON; SPUTTER DEPOSITION; THIN FILMS; TITANIUM COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

EID: 1842535201     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1023/B:JMSC.0000016213.77001.71     Document Type: Article
Times cited : (39)

References (6)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.