In situ X-ray Photoelectron, Ultraviolet Photoelectron, and Auger Electron Spectroscopy Spectra from First-Row Transition-Metal Nitrides: ScN, TiN, VN, and CrN

Surface Science Spectra

Volumn 7, Issue 3, 2000, Pages 167-168

  Gall, D ^a   Haasch, R T ^a   Finnegan, N ^a   Lee, T Y ^a   Shin, C S ^a   Sammann, E ^a   Greene, J E ^a   Petrov, I ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AUGERS; CHROMIUM COMPOUNDS; CRYSTAL IMPURITIES; ETCHING; PHOTOELECTRONS; PHOTONS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON WAFERS; SINGLE CRYSTALS; TIN; TITANIUM NITRIDE; TRANSITION METALS; ULTRAHIGH VACUUM; X RAY PHOTOELECTRON SPECTROSCOPY;

AUGER-ELECTRON SPECTROSCOPY; CRYSTAL TRANSITION; DEPOSITION SYSTEMS; EPITAXIAL SINGLE CRYSTALS; FIRST ROW TRANSITION METALS; MAGNETRON SPUTTER DEPOSITION; NEAR STOICHIOMETRIC; SPECTRA'S; TRANSITION METAL NITRIDES; X-RAY PHOTOELECTRONS;

AUGER ELECTRON SPECTROSCOPY;

EID: 1842530133     PISSN: 10555269     EISSN: 15208575     Source Type: Journal    
DOI: 10.1116/1.1360984     Document Type: Article

References (2)

1. J.-E.Sundgren, B. O.Johansson, A.Rockett, S. A.Barnett, and J. E.Greene, in Physics and Chemistry of Protective Coatings, edited by J. E.Greene, W. D.Sproul, and J. A.Thornton, American Institute of Physics Series 149 (AIP, New York, 1986), p. 95.
2. J. F.Moulder, W. F.Stickle, P. E.Sobol, and K. D.Bomben, Handbook of X-ray Photoelectron Spectroscopy, edited by J.Chastain and R. C.King, Jr. (Physical Electronics Inc., Eden Prairie, MN, 1995).