Integrated Phase Shift Measurements For Advanced Mask Etch Process Control

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5256, Issue 1, 2003, Pages 76-84

  Sahin, Turgut ^a   Collard, Corey ^a,c   Anderson, Scott A ^a   Mak, Alfred W ^a   Brooks, Cynthia B ^a   Buie, Melisa J ^a   Walsh, Phillip ^b   Li, George ^b  

^a Etec Systems   (United States)

^b N and K Technology Inc   (United States)

^c APPLIED MATERIALS INC   (United States)

Author keywords

Alternating Aperture Phase Shift Masks; Broadband Spectrophotometry; Chrome less Phase Shift Masks; Integrated Metrology; Phase Shift Measurement; Quartz Phase Shift Masks; Trench Depth Measurement

Indexed keywords

ETCHING; INTERFEROMETERS; MATHEMATICAL MODELS; PHASE SHIFT; QUARTZ; SPECTROPHOTOMETRY; THIN FILMS;

ALTERNATING APERTURE PHASE SHIFTING MASKS (AAPSM); CHROME-LESS PHASE SHIFT MASKS; INTEGRATED METROLOGY; TRENCH DEPTH MEASUREMENT;

MASKS;

EID: 1842527942     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.518272     Document Type: Conference Paper

References (6)

1. See http://www.simmtester.com, http://www.eetimes.com, or any number of online resources.
2. A. R. Forouhi and I. Bloomer, "Optical Dispersion Relations for Amorphous Semiconductors and Amorphous Dielectrics",Physical Review B, 34, p. 7018, 1986.
3. A. R. Forouhi and I. Bloomer, "Optical Properties of Crystalline Semiconductors and Dielectrics", Physical Review B, 38, p. 1865, 1988.
4. C. B. Brooks, M. J. Buie, N. L. Waheed, P. M. Martin, P. Walsh, and G. Evans, "Process Monitoring of Etched Quartz Phase Shift Reticles", SPIE, 4889, p. 25, 2002.
5. R. Herrick, T. Pardue, and P. Walsh, "Using Broadband Reflectometry for Fast Trench-Depth Measurement", Solid State Technology, pp. 53-59, February 2003.
6. A. Callegari and K. Babich, "Optical Characterization of Attenuated Phase Shifters", SPIE, 3050, p. 507, 1997.