SCOPUS 정보 검색 플랫폼

Volumn 39, Issue 6, 2004, Pages 2243-2247

One-step fabrication of polymer thin films with lithographic bas-relief micro-pattern and self-organized micro-porous structure

(3) Ohzono, T a Nishikawa, T a Shimomura, M a,b

a RIKEN (Japan)

b HOKKAIDO UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC HUMIDITY; COPOLYMERS; ELASTOMERS; FABRICATION; MICROPOROSITY; NETWORKS (CIRCUITS); PHASE SEPARATION; PHOTOLITHOGRAPHY; PLASTIC FILMS; SCANNING ELECTRON MICROSCOPY;

CAPILLARY FORCES; MICRO-POROUS STRUCTURES;

THIN FILMS;

EID: 1842508231 PISSN: 00222461 EISSN: None Source Type: Journal
DOI: 10.1023/B:JMSC.0000017799.20962.4f Document Type: Article

Times cited : (26)

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