Quasi-Langmuir-Blodgett thin film deposition of carbon nanotubes

Journal of Applied Physics

Volumn 95, Issue 6, 2004, Pages 3228-3230

  Armitage, N P ^a   Gabriel, J C P ^b   Gruner G ^a,b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b Nanomix Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON NANOTUBE FILMS; TEMPERATURE DEPENDENCE;

CHEMICAL VAPOR DEPOSITION; CMOS INTEGRATED CIRCUITS; DEPOSITION; DISPERSIONS; FIELD EFFECT TRANSISTORS; FILM GROWTH; LANGMUIR BLODGETT FILMS; MICROSTRUCTURE; MORPHOLOGY; NANOTECHNOLOGY; SCANNING ELECTRON MICROSCOPY; SPIN COATING; THIN FILMS;

CARBON NANOTUBES;

EID: 1842478894     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1646450     Document Type: Article

References (18)

1. M. Dresselhaus, G. Dresselhaus, P. Eklund, and R. Saito, Phys. World 11, 33 (1998).
2. C. Dekker, Phys. Today 52, 22 (1999).
3. A. Bachtold, P. Hadley, T. Nakanishi, and C. Dekker, Science 294, 1317 (2001).
4. R. Martel, T. Schmidt, H. R. Shea, T. Hertel, and P. Avouris, Appl. Phys. Lett. 73, 2447 (1998).
5. J.-C. P. Gabriel et al, Mater. Res. Soc. Symp. Proc. 762, Q.12.17.1-7 (2003)
6. E. S. Snow, J. P. Novak, P. M. Campbell, and D. Park, Appl. Phys. Lett. 82, 2145 (2003).
7. P. G. Collins, K. Bradley, M. Ishigami, and A. Zettl, Science 287, 1801 (2000).
8. J. Kong, N. R. Franklin, C. Zhou, M. G. Chapline, S. Peng, K. Cho, and H. Dai, Science 287, 622 (2000).
9. R. J. Chen, Y. Zhang, D. Wang, and H. J. Dai, J. Am. Chem. Soc. 123, 3838 (2001).
10. M. Shim, N. W. S. Kam, R. J. Chen, Y. Li, and H. Dai, Nano Lett. 2, 285 (2002).
11. A. Modi et al., Nature (London) 424, 171 (2003).
12. N. P. Armitage, P. Tran, and George Grüner (unpublished).
13. J. L. Bahr et al., Chem. Commun. (Cambridge) 2, 193 (2001).
14. H. Shimoda, L. Fleming, K. Horton, and O. Zhou, Physica B 323, 135 (2002).
15. Z. Zhang, B. Q. Wei, G. Ramanath, and P. M. Ajayan, Appl. Phys. Lett. 77, 3764 (2000).
16. B. Q. Wei et al., Nature (London) 416, 495 (2002).
17. V. Krstic et al., Chem. Mater. 10, 2338 (1998).
18. I. W. Chiang et al., J. Phys. Chem. B 105, 8297 (2001).