Characteristics of ZnO Thin Film Deposited on Various Metal Bottom Electrodes

Metals and Materials International

Volumn 9, Issue 4, 2003, Pages 383-387

  Jeon, Young Ah ^a   No, Kwang Soo ^a   Kim, Jong Sung ^b   Yoon, Young Soo ^c  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Gachon University College of Medicine   (South Korea)

^c Korea Institute of Science and Technology   (South Korea)

Author keywords

Radio frequency (rf) sputtering; Various metal bottom electrodes; ZnO thin Film

Indexed keywords

BACKSCATTERING; CRYSTALLINITY; ELECTRODES; II-VI SEMICONDUCTORS; METALLIC FILMS; MORPHOLOGY; NICKEL COMPOUNDS; OPTICAL FILMS; OXIDE MINERALS; RADIO WAVES; RESIDUAL STRESSES; SCANNING ELECTRON MICROSCOPY; SURFACE MORPHOLOGY; ZINC OXIDE;

BOTTOM ELECTRODES; COMPRESSIVE RESIDUAL STRESS; ELECTRONIC APPLICATION; MORPHOLOGY AND COMPOSITION; PREFERRED ORIENTATIONS; RADIO-FREQUENCY SPUTTERING; RUTHERFORD BACK-SCATTERING SPECTROMETRY; ZNO THIN FILM;

THIN FILMS;

EID: 1842472245     PISSN: 15989623     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF03027192     Document Type: Article

References (17)

1. O. Yamazaki, T. Mitsuyu, and K. Wasa, IEEE Trans. Sonics Ultrason. SU-27, 369 (1980).
2. F. S. Hickemel, IEEE Trans. Sonics Ultrason. SU-32, 621 (1980).
3. T. Minami, H. Nanto, and Takata, Jpn. J. Appl. Phys. 23, L289 (1984).
4. J. Hu and R. G. Gordon, J. Appl. Phys. 71, 880 (1992).
5. R. D. Gould, A. K. Hassan, and F. S. Mahmood, Int. J. Electron. 76, 901 (1994).
6. I. Itoh and T. Suga, Appl. Phys. Lett. 64, 37 (1994).
7. J. Muller and S. Wessenrider, Fresenius J. Anal. Chem. 349, 380 (1994).
8. S. Ghosh, A. Sarkar, S. Bhattacharys, S. Chaudhuri, and A. K. Pal, J. Cryst. Growth 108, 534 (1991).
9. F. S. Hickernell, J. Appl. Phys. 44, 1061 (1973).
10. K. H. Youn, J. W. Choi, and D. H. Lee, Thin Solid Films 302, 116 (1997).
11. M. F. Ogawa, Y. Natsume, and T. Hirayama, J. Mater. Sci. Lett. 9, 1351 (1990).
12. C. Eberspacher, A. L. Fahrenbrunch, and R. H. Bube, Thin Solid Films 136, 1 (1986).
13. N. J. Ianno, L. McConville, N. Shaikh, S. Pittal, and P. G. Snyder, Thin Solid Films 220, 92 (1992).
14. T. Okamura, Y. Seki, S. Nagakari, and H. Okushi, Jpn. J. Appl. Phys. 31, L762 (1992).
15. W. S. Law and S. J. Fonash, J. Electron. Mater. 16, 141 (1987).
16. B. D. Cullity, Elements of X-ray Diffraction, Addison-Wesley, USA (1977).
17. N. Fujiwara, T. Nishihara, S. Goto, J. Xu, and T. Ito, J. Cryst. Growth 130, 269 (1993).