The toughness of free-standing CVD diamond

Journal of Materials Science

Volumn 39, Issue 5, 2004, Pages 1571-1574

  Davies, A R ^a   Field, J E ^a   Takahashi, K ^b   Hada, K ^b  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b JAPAN ATOMIC ENERGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; CHEMICAL VAPOR DEPOSITION; CRACK PROPAGATION; CRYSTALS; DIELECTRIC MATERIALS; FRACTURE TOUGHNESS; INDENTATION; MILLIMETER WAVES; NUCLEATION; OPTICAL MICROSCOPY; SILICON; STRESS ANALYSIS; SURFACE ROUGHNESS;

CLEAVAGE PLANES; FOUR-POINT BEND TESTS;

DIAMONDS;

EID: 1842456847     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1023/B:JMSC.0000016153.90600.a6     Document Type: Article

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