An Electrochemical Etching Procedure for Fabricating Scanning Tunneling Microscopy and Atom-Probe Field-Ion Microscopy Tips

Metals and Materials International

Volumn 9, Issue 4, 2003, Pages 399-404

  Kim, Yeong Cheol ^a   Seidman, David N ^b  

^a Korea University of Technology and Education   (South Korea)

^b Northwestern University   (United States)

Author keywords

Electrochemical etching; FIM; STM; Tips

Indexed keywords

ELECTROCHEMICAL ETCHING; ION MICROSCOPES; PLASTIC DEFORMATION; PROBES;

ATOM PROBE FIELD-ION MICROSCOPIES; CHEMICAL SOLUTIONS; TIPS;

SCANNING TUNNELING MICROSCOPY;

EID: 1842419659     PISSN: 15989623     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF03027195     Document Type: Article

References (30)

1. H. W. Fink, IBM J. Res. Develop. 30, 460 (1986).
2. Private Communication with Prof. Jun Nogami, University of Wisconsin-Milwaukee.
3. V. T. Binh, J. Microscopy 152, 355 (1988); V. T. Binh, Surf. Sci. 202, L539 (1988).
4. V. T. Binh, J. Microscopy 152, 355 (1988); V. T. Binh, Surf. Sci. 202, L539 (1988).
5. J. P. Ibe, P. P. Bey, Jr., S. L. Brandow, R. A. Brizzolara, N. A. Burnham, D. P. DiLella, K. P. Lee, C. R. K. Marrian, and R. J. Colton, J. Vac. Sci. Tech. A 8, 3570 (1990).
6. V. Weinstein, M. Slutzky, A. Arenshtam, and E. Ben-Jacob, Rev. Sci. Instrum. 66, 3075 (1995).
7. S. F. Ceballos, G. Mariotto, S. Murphy, and I. V. Shvets, Surf. Sci. 523, 131 (2003).
8. R. Nicolaides, Y. Liang, W. E. Packard, Z. Fu, H. A. Blackstead, K. K. Chin, John D. Dow, J. K. Furdyna, W. M. Hu, R. C. Jaklevic, W. J. Kaiser, A. R. Pelton, and M. V. Zeller, J. Vac. Sci Tech. A 6, 445 (1988).
9. M. Fotino, Rev. Sci. Instrum. 64, 159 (1993).
10. A. Cricenti, E. Paparazzo, M. A. Scarselli, L. Moretto, and S. Selci, Rev. Sci. Instrum. 65, 1558 (1994).
11. P. J. Bryant, H. S. Kim, Y. C. Zheng, and R. Yang, Rev. Sci. Instrum. 58, 1115 (1987).
12. R. Guckenberger, C. Kosslinger, R. Gatz, H. Breu. N. Levai, and W. Baumeister, Ultramicroscopy 25, 111 (1988).
13. H. Bourque and R. M. Leblanc, Rev. Sci. Instrum. 66, 2695 (1995).
14. L. Libioulle, Y. Houbion, and J. M. Gilles, Rev. Sci. Instrum. 66, 97 (1995).
15. B. W. Krakauer and D. N. Seidman, Rev. Sci. Instrum. 63, 4071 (1992); B. W. Krakauer, J. G. Hu, S. M. Kuo, R. L. Mallick, A. Seki, D. N. Seidman, J. P. Baker, and R. Loyd, Rev. Sci. Instrum. 61, 3390 (1990).
16. B. W. Krakauer and D. N. Seidman, Rev. Sci. Instrum. 63, 4071 (1992); B. W. Krakauer, J. G. Hu, S. M. Kuo, R. L. Mallick, A. Seki, D. N. Seidman, J. P. Baker, and R. Loyd, Rev. Sci. Instrum. 61, 3390 (1990).
17. J. W. Johnson and C. L. Wu, J. Electrochem. Soc. 118, 1909 (1989).
18. G. S. Kelsey, J. Electrochem. Soc. 124, 814 (1977).
19. W. M. Latimer, The Oxidation States of the Elements and Their Potentials in Aqueous Solutions, p. 32, Prentice-Hall, Englewood Cliffs (1952).
20. W. J. Moore, Physical Chemistry, p. 473, Prentice-Hall, Englewood Cliffs (1958).
21. C. J. Chen, Introduction to Scanning Tunneling Microscopy, Chap. 13, Oxford University Press, New York (1993); R. Zhang and D. G. Ivey, J. Vac. Sci. Tech. B14, 1 (1996).
22. C. J. Chen, Introduction to Scanning Tunneling Microscopy, Chap. 13, Oxford University Press, New York (1993); R. Zhang and D. G. Ivey, J. Vac. Sci. Tech. B14, 1 (1996).
23. Goodfellow Catalog, p. 31 (1995/1996).
24. D. I. Bolef and J. de Kleark, J. Appl. Phys. 33, 2311 (1962).
25. Y. C. Kim, C. J. Yu, and D. N. Seidman, J. Appl. Phys. 81, 944 (1997).
26. G. Ehrlich and F. G. Hudda, J. Chem. Phys. 44, 1036 (1966); T. T. Tsong, Phys. Rev. B 6, 417 (1972); G. L. Kellogg, Surf. Sci. Rep. 21, 1 (1994).
27. G. Ehrlich and F. G. Hudda, J. Chem. Phys. 44, 1036 (1966); T. T. Tsong, Phys. Rev. B 6, 417 (1972); G. L. Kellogg, Surf. Sci. Rep. 21, 1 (1994).
28. G. Ehrlich and F. G. Hudda, J. Chem. Phys. 44, 1036 (1966); T. T. Tsong, Phys. Rev. B 6, 417 (1972); G. L. Kellogg, Surf. Sci. Rep. 21, 1 (1994).
29. T. Sakurai, Y. Hasegawa, T. Hashizume, I. Kamiya, T. Ide, I. Sumita, H. W. Pickering, and S. Hyodo, J. Vac. Sci. Tech. A 8, 259 (1990).
30. Y. Kobayashi and K. Sugii, J. Vac. Sci. Tech. B 9, 748 (1991).