The even device fabricated by the deep etched binary optics technology for the exposure system of the quasi-molecule laser

Science in China, Series E: Technological Sciences

Volumn 45, Issue 1, 2002, Pages

  Xu, Ping ^a   Sun, Yiling ^a   Li, Jingzhen ^a  

^a SHENZHEN UNIVERSITY   (China)

Author keywords

Deep etched binary optics; Element; Error analysis; Even device

Indexed keywords

EID: 18344405484     PISSN: 10069321     EISSN: None     Source Type: Journal    
DOI: 10.1360/02ye9001     Document Type: Article

References (3)

1. Xu Ping, Tang Jiyue, Guo Lurong et al., Deep etch element of binary optics, Acta Optica Sinica, 1996, 16(12): 1796-1801.
2. Xu Ping, Tang Jiyue, Guo Lurong et al., Fabrication error simulation of deep etched binary optics, Chinese Journal of Laser, 1997, 24(2): 536-543.
3. Xu Ping, Tang Jiyue, Guo Lurong et al., Diffraction analysis on deep-etch continuous phase relief microoptics element, Chinese Journal of Laser, 1996, 23(9): 819-823.