Point defect behaviour resulting from dopant diffusions in Silicon

Defect and Diffusion Forum

Volumn 148-149, Issue , 1997, Pages 48-102

  Okino, T ^a  

^a NIPPON BUNRI UNIVERSITY   (Japan)

Author keywords

Diffusion; Dopant; Impurity Diffusion; Microdefect; Oxidation Stacking Fault; Point Defect; Self Diffusion; Semiconductor; Silicon; Swirl Defect; Vacancy Self Interstitial

Indexed keywords

EID: 18244421635     PISSN: 10120386     EISSN: 16629507     Source Type: Journal    
DOI: 10.4028/www.scientific.net/ddf.148-149.48     Document Type: Article

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