Electrodeposition of noble metal nanoparticles on carbon nanotubes

Journal of the American Chemical Society

Volumn 127, Issue 17, 2005, Pages 6146-6147

  Quinn, Bernadette M ^a   Dekker, Cees ^a   Lemay, Serge G ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; METAL; NANOPARTICLE; NANOTUBE;

ARTICLE; ELECTROCHEMISTRY; ELECTRODE; IMAGE ANALYSIS; MICROSCOPY; NANOTECHNOLOGY;

EID: 18244400116     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja0508828     Document Type: Article

References (25)

1. (a) Dai, H. Acc. Chem. Res. 2002, 35, 1035.
2. (b) Zhang, Y.; Dai, H. App. Phys. Lett. 2000, 77, 3015.
3. (c) Zhang, Y.; Franklin, N. W.; Chen, R. J.; Dai, H. Chem. Phys. Lett. 2000, 331, 35.
4. (d) Guo, D.-J.; Li, H.-L. J. Electroanal. Chem. 2004, 573, 197.
5. (e) Kong, J.; Chapline, M. G.; Dai, H. Adv. Mater. 2001, 13, 1384.
6. (f) Choi, H. C.; Shim, M.; Bangsaruntip, S.; Dai, H. J. Am. Chem. Soc. 2002, 124, 9058.
7. (g) Girishkumar, G.; Vinodgopal, K.; Kamat, P. V. J. Phys. Chem. B 2004, 108, 19960.
8. (h) Hrapovic, S.; Liu, Y.; Male, K. B.; Luong, J. H. T. Anal. Chem. 2004, 76, 1083.
9. (i) Unger, E.; Duesberg, G. S.; Liebau, M.; Graham, A. P.; Seidel, R.; Kreupl, F.; Hoenlein, W. Appl. Phys. A 2003, 77, 735.
10. (j) Xing, Y. J. Phys. Chem. B 2004, 108, 19255.
11. (k) Serp, P.; Comas, M.; Kalck, P. Appl. Catal., A 2003, 253, 337.
12. (l) Song, J. H.; Yiying, W.; Messer, B.; Kind, H.; Yang, P. J. Am. Chem. Soc. 2001, 123, 10397.
13. Zoval, J. V.; Lee, J.; Gorer, S.; Penner, R. M. J. Phys. Chem. B 1998, 102, 1166.
14. Heller, I.; Kong, J.; Heering, H. A.; Williams, K. A.; Lemay, S. G.; Dekker, C. Nano Lett. 2005, 5, 137.
15. (a) Kong, J.; Soh, H. T.; Cassell, A. M.; Quate, C. F.; Dai, H. J. Nature 1998, 395, 878.
16. (b) Some ropes are also formed during CVD growth. Deposition on ropes and on individual SWNTs was comparable.
17. Day, T. M.; Wilson, N. R.; Macpherson, J. V. J. Am. Chem. Soc. 2004, 126, 16724.
18. Penner, R. M. J. Phys. Chem. B 2002, 106, 3339.
19. Native Ti oxide layer breakdown occurs at E < 0 V, but there was no evidence of metal deposition on the underlying Ti under our experimental conditions.
20. Zoval, J. V.; Stiger, R. M.; Biernacki, P. R.; Penner, R. M. J. Phys. Chem. 1996, 100, 837.
21. Chen, S.; Kucernak, A. J. Phys. Chem. B 2003, 107, 8392.
22. Ung, T.; Liz-Marzan, L. M.; Mulvaney, P. J. Phys. Chem. B 2001, 105, 3441.
23. (a) Banks, C. E.; Moore, R. R.; Davies, T. J.; Compton, R. G. Chem. Commun. 2004, 2004, 1804.
24. (b) Musameh, M.; Lawrence, N. S.; Wang, J. Electrochem. Commun. 2005, 7, 14.
25. Stadermann, M. et al. Phys. Rev. B 2004, 69, 201402.